Microelectronics letters journals IEEE Electron Device letters Applied physics Letters Available online at libraries mit edu Click on vera (Virtual Electronic Resource Access)
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Review of process Structures to be tested Sheet resistance MOS Capacitor Fall 2003-MA schmidt
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Why spend a whole lecture on oxidation of Si? Ge has high ue, Wh, Ge stable but no oxide GaAs has high ue and direct band Why sio? Sio, is stable down to 10 9 Torr. T>900C Sio can be etched with hf which leaves si unaffected
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Processes: gift of Slo2-Expose Si to steam = uniform insulating layer or metal film growth: high vacuum, single element Contrast with CVD: toxic, corrosive gas flowing through valves
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What does Materials Science have to do with Microelectronic Processing? Need to understand DIfferences: metals, oxides and semiconductors Atomic bonding Oxidation rates
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What does Materials Science have to do with Microelectronic Processing? Need to understand DIfferences: metals, oxides and semiconductors Atomic bonding Oxidation rates, compound formation(GaAs)
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8.1差错控制编码的基本概念 8.1.1差错控制方式 图8-1差错控制系统
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7.1进制数字调制 7.1.1二进制幅度键控(2ASK)
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6.1数字基带信号的码型 6.1.1数字基带信号的码型设计原则 6.1.2二元码
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5.1脉冲编码调制(PCM) 5.1.1脉冲编码调制的基本原理
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