Examples of Replica Image (1 Lower Incident 七80.6C mass beam thickness Hicher mass thickness Objective lens Ohjective aperture 图32165M■钢，930℃加热+320℃8m等温，2%苦味酸酒裤浸烛，下贝氏体组互 Image plane 口)充学显就简豫1000×b)塑料-最二领发型，C:30'投能，电子旦数镜像18000x Intensinv profile LM TEM Figure 22.4.Mechanism of mass-thickness contrast in a BF image. Thicker or higher-Z areas of the specimen (darker)will seatter more elec- UB-65Mn trons off axis than thinner or lower-mass (lighter)areas.Thus fewer elec- trons from the darker region fall on the equivalent area of the image plane (and subsequently the screea).which therefore appears darker in BF images. Lower Upper Bainites 65Mn-1203K+593K/8min 0.6C -1173K+50K/s cooling 图3-200.6%C铜，900℃加热，50℃/：挎却，上具氏体组织 0)光学量价镜份：0e0x6)Formvar一级复型(2%火棉胶建要)G445投那，电子显最黄建000×
Examples of Replica Image（1） Lower & Upper Bainites 65Mn – 1203K+593K/8min 0.6C – 1173K+50K/s cooling LM TEM LB – 0.6C UB - 65Mn
Examples of Replica Image (2) dimple 跑rbd心件traction replic求丠G.B.c白rbides' 8)债抽取复型250% ×b)电于指射花伊 in a superalloy cleavas fatigue Carbon extr.replica -austenitic steel 图3-28 类t伦sile fracture的t712ooc1小时+水诈+ 366 900℃30小时+求率，在-196℃拉断裂，践抽取复型10000×
Examples of Replica Image （2） cleavage dimple fatigue Carbon extraction replica – G.B. carbides in a superalloy Carbon extr. replica – austenitic steel tensile fractured at 77K EDP [-1-30] zone
Electron Diffraction Patterns Evaporated Au film-FCC poly.Cryst. a-Fe area in a steel-BCC single crystal 011]a zone For CUBIC crystals,the allowed (F#0)reflections N=h2+k2+/2 FCC:3,4,8,11,.… BCC:2,4,6,8
Electron Diffraction Patterns 111 Evaporated Au film – FCC poly. Cryst. -Fe area in a steel - BCC single crystal 000 200 220 000 200 2-11 0-11 [011] zone 111 220 200 311 For CUBIC crystals, the allowed (F≠0) reflections – N = h2+k2+l2 FCC: 3, 4, 8, 11, … BCC: 2, 4, 6, 8, …
KIKUCHI Diffraction Elestically scattered electrons resulting in diffrac.spots or rings Inelastically scattered background of the pattern 300 。 If thickness fairly thick 001TA3 (e.g.around 100 nm,or >penetratable and not severly strained pairs of bright-dark lines appear Named after the discoverer S.Kikuchi ·000 KIKUCHI (diffraction)pattern Usually coexisting with sports when too thick, 013TIAl3 even only Kikuchi pattern visible Fig.13.Meatron difrraotion pattarns of the TLAI natrix in 年2t-re9sadt36A15b,55(1与1116y.4a【601】a0e: tb】ct打abnM
KIKUCHI Diffraction • Elestically scattered electrons － resulting in diffrac. spots or rings • Inelastically scattered － background of the pattern • If thickness fairly thick （e.g. around 100 nm，or > ½ penetratable ) and not severly strained － pairs of bright-dark lines appear • Named after the discoverer S. Kikuchi － KIKUCHI (diffraction) pattern － Usually coexisting with sports － when too thick, even only Kikuchi pattern visible
Principle of KIKUCHI Diffraction 入速 Two cones fastened on (hkl plane ! [B-Ir't a)-1e 1T透射束 LpIo' ©非弹性散射电子强变的偏 分布021月21() )品面（有k)对非弹性散射电子的衔射 净减：-(1p-10) 净增+(p-Q Darkerline (R=L20-AL/dat=iLN) d)荐海找对的产生反其新制八何 Brighter line 亮浅 C)南池园引起的背景强度支化 图4-33菊池级对的产生及其几何特在 ●)套弹桂散射电子强度的角分布B:>日，IB)<I日：)6)品画(MD对非弹性教射电子的新射 c)菊滋而射引起的骨景磁度变化)看陆线对的产生及其箱制几用
Principle of KIKUCHI Diffraction Brighter line Darker line Two cones fastened on (hkl) plane !!