Can Lithography get you there? Proximity lithography 6.12J/3.155J Microelectronic processing OBJECT PLACEHOLDER This object has been removed because it is not by MIT. It may be reinstated future Fresnel (near field diffraction): n<g< W2/n Minimum resolved feature =(g) For g= 20 microns, A=436 nm=>3 microns Dec.10,2003
D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Fresnel (near field diffraction): l < g < W2/ l Minimum resolved feature = (lg)1/2 Can Lithography get you there? Proximity lithography For g = 20 microns, l = 436 nm => 3 microns OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future
Can Projection lithography get you there? 6.12J/3.155J Microelectronic processing OBJECT PLACEHOLDER OBJECT PLACEHOLDER This object has been removed because it is not This object has been owned by MIT. It may be removed because it is not reinstated or replaced in owned by MT. It may be reinstated or replaced in Fraunhoffer(far field diffraction) imum resolved feature nfld(no limit on lens diameter, d For f=d, n=436 nm=>0.4 microns Dec.10,2003
D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Fraunhoffer (far field diffraction): Minimum resolved feature = lf/d (no limit on lens diameter, d) Can Projection lithography get you there? For f ≈ d, l = 436 nm => 0.4 microns OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future. OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future
Beyond Optical a X-Ray Masks Wavelength Energy ■ Sources Light U\ 400 nm E-Beam a Speed E Deep uv 250 nm 4.96eV Electron Scattering X-Ray 0.5nm 2480el a Nano-imprint Soft-Litho h1.23 mv ve(e Fall 2003-MA Schmidt 3.] 6. 152]-Lecture 11-Slide 18
D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing l = hc E l = h mv = 1.23 E(eV) (Å)
Recall semiconductor physical limits 6.12J/3.155J Microelectronic processing Semiconductor scaling challenges diffusion length control, statistics, especially for channel Thermal management, v2/R Power den: pentium: pentium lll a pentium l: nuclear reactor Dielectric breakdown field, v/d ◆ Interconnect cross-talk, delay,c↓,T=LC Information stability: KBT> CV2 ◆ Screening lengths (range of band bending, depletion regions) Electron concentration If not semiconductors, then what other information technologies? Dec.10,2003
D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Semiconductor scaling challenges: w diffusion length control, statistics, especially for channel w Thermal management, V 2/R Power den.: Pentium: Pentium III :: Pentium III: Nuclear Reactor w Dielectric breakdown field, V/d w Interconnect cross-talk, delay, CØ , t = L/C w Information stability: kBT > CV 2 w Screening lengths (range of band bending, depletion regions) Recall semiconductor physical limits Electron concentration If not semiconductors, then what other information technologies? …
Size limitations on other information technologies 6.12J/3.155J Microelectronic processing Magnetic disk storage media OBJECT PLACEHOLDER owned by MIT. It may be reinstated or replaced in Schematic of longitudinal recording medium OBJECT PLACEHOLDER OBJECT PLACEHOLDER This object has beer his object has been removed because it is not removed because it is not owned by MIT. It may be owned by MIT. It may be reinstated or replaced in reinstated or replaced in Each bit(currently about 0.5 X 0.08 X0.03 um -=10 Gb/in) Consists of 1000 grains; noise a N-l/2 Dec
D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Size limitations on other information technologies Schematic of longitudinal recording medium Magnetic disk storage media Each bit (currently about 0.5 x 0.08 x 0.03 µm - ≈ 10 Gb/in2 ) Consists of 1000 grains; noise µ N-1/2 OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future. OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future. OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future