Now add evaporation source e-beam ooooo ooooo B field Resistive heater RF-induction heater △H Equilibrium vapor pressure py=po exp 4H= heat of vaporization Strong t dependence Work function ee Heat of vaporization solid 6.152J3.155J
6.152J/3.155J 6 Now add evaporation source Equilibrium vapor pressure: ∆H = heat of vaporization pv = p0 exp − ∆H kBT Strong T dependence e- + _ e-beam B field Resistive heater I RF-induction heater Work function e- Heat of vaporization solid V(x) free
Vapor pressure of elements employed in semiconductor materials. Dots correspond to melting points Rely on tables, attached: Pvapor>>Pvac Elemental metals easy to evaporate, but.y -2 alloys Differential Vapor compounds so use 2 crucibles or deposit multilayers and diffuse Oxides, nitrides deposit in oxygen (or other) partial p 00 400600800100015062000 6.152J3.155J TEMPERATURE (K
6.152J/3.155J 7 Vapor pressure of elements employed in semiconductor materials. Dots correspond to melting points Rely on tables, attached: pvapor > > pvac, Elemental metals easy to evaporate, but… alloys compounds Differential pvapor so use 2 crucibles or deposit multilayers and diffuse Oxides, nitrides deposit in oxygen (or other) partial p