2.Microarray manufacturing The three main manufacturing methods: 。 Contact printing:uses direct contact between the printing implement or the sample contained in the implement and the microarray substrate; Noncontact printing:on-the-fly printing including ink-jet tech.,microsolenoid tech.,and thermal bubble jet dispenser, Semiconductor tech:photolithographic masks and micromirrors
2.Microarray manufacturing The three main manufacturing methods: • Contact printing:uses direct contact between the printing implement or the sample contained in the implement and the microarray substrate; • Noncontact printing:on-the-fly printing including ink-jet tech.,microsolenoid tech.,and thermal bubble jet dispenser; • Semiconductor tech: photolithographic masks and micromirrors
Microscopic elements: DSemiconductor tech produce 15~30um features 2 Printed spot size is 50~350 um 3 Tissue spot is 200~600 um Macroarrays contain sample spot sizes of about 300 microns or larger microarray are typically less than 200 microns in diameter
• Microscopic elements: ①Semiconductor tech produce 15~30μm features ② Printed spot size is 50~350 μm ③ Tissue spot is 200~600 μm Macroarrays contain sample spot sizes of about 300 microns or larger microarray are typically less than 200 microns in diameter
Gene chips的制备 在片原位光刻合成 O d NTP-5'-光敏保护基因 光照 一O-dNTP-OH+dNTP-5-保护基因
Gene chips的制备 在片原位光刻合成 • O d NTP- 5´-光敏保护基因 光照 O dNTP-OH + dNTP -5´-保护基因
N02 偶联反应 封闭反应 氧化反应 0 5'CH2 Base 0 HO 0 OH Ba se s'CH2 Base 0. 光照 C02 脱保护基 R-0-P=0 R—0 =0 77777☑ 在片原位喷印合成
在片原位喷印合成
Gene chips的制备 cDNA点样法 醛基修饰玻片 ,Silanized slide(与DNA上氨基反应) Silane slide 氨基修饰玻片 Silylated slide(UV照射与DNA交联) Polylysine slide 玻片氨基化举例： OH C2HsO. 个0、 0H+C2H0Si-(C五p-N旺+ OH C2H50 0
Gene chips的制备 cDNA点样法 醛基修饰玻片 Silanized slide（与DNA上氨基反应） Silane slide 氨基修饰玻片 Silylated slide（UV照射与DNA交联） Polylysine slide 玻片氨基化举例：