Thin Film Deposition磁控溅射 How A Magnetron Works The electrons are trapped in a magnetic tunnel The trapped electrons generate more ions Some advanced sputtering systems use moving magnets to improve step coverage, uniformity, and target use Magnetic Field Lines Trapped Electrons Target Ns N Magnets zhang@fudan.edu.cn复旦大学张荣君
rjzhang@fudan.edu.cn 复旦大学 张荣君 Thin Film Deposition 磁控溅射 • How A Magnetron Works: – The electrons are trapped in a magnetic tunnel. – The trapped electrons generate more ions. – Some advanced sputtering systems use moving magnets to improve step coverage, uniformity, and target use. N S N S S N Magnetic Field Lines Trapped Electrons Target Magnets
Thin Film Deposition Process Concerns with Sputtering Hillock Growth: EXcess heat generated by the plasma can cause hillock growth, grains which relieve the stress in the film by growing upward Poor Step Coverage due to physical nature of the process Metal Step Coverage Hillock growth Deposition 23 zhang@fudan.edu.cn复旦大学张荣君
rjzhang@fudan.edu.cn 复旦大学 张荣君 Thin Film Deposition • Process Concerns with Sputtering: – Hillock Growth: Excess heat generated by the plasma can cause hillock growth, grains which relieve the stress in the film by growing upward. – Poor Step Coverage due to physical nature of the process. Hillock Growth Metal Step Coverage Deposition 23
Thin Film Deposition · Step Coverage(台阶覆盖): SC= Horiz/Tvert X 100% Wafer Substrate horizontal Bad ducn复旦大学张荣君
rjzhang@fudan.edu.cn 复旦大学 张荣君 Thin Film Deposition • Step Coverage（台阶覆盖）: – SC = Thoriz/Tvert X 100%
Thin Film Deposition Step Coverage with Sputtered Films Sloped sidewall SiO Width Vertical Sidewall -No Plug ② Thinning Vertical Sidewall -with Plug Plu Width zhang@fudan.edu.cn复旦大学张荣君
rjzhang@fudan.edu.cn 复旦大学 张荣君 Thin Film Deposition • Step Coverage with Sputtered Films:
Evaporation蒸发镀膜 °将源材料(金属或化合物)和基片放置 于真空室中,加热源材料,使之气化蒸 发或升华,并输送、沉积到基片表面, 凝聚成一层或多层薄膜。 蒸发镀膜按照加热方式可以分为:电阻 丝加热、电子束加热蒸发、激光加热蒸 发、高频感应加热蒸发镀膜等 zhang@fudan.edu.cn复旦大学张荣君
rjzhang@fudan.edu.cn 复旦大学 张荣君 Evaporation蒸发镀膜 • 将源材料（金属或化合物）和基片放置 于真空室中，加热源材料，使之气化蒸 发或升华，并输送、沉积到基片表面， 凝聚成一层或多层薄膜。 • 蒸发镀膜按照加热方式可以分为：电阻 丝加热、电子束加热蒸发、激光加热蒸 发、高频感应加热蒸发镀膜等