I. Plot resolution and depth of field as a function of exposure wavelength for a projection aligner with 100nm< A <500nm. Assume NA=0.26. Recalculate on the same plot for NA=0.41. Discuss the implication of these plots for the technologist that must manufacture transistors with 0.5 um
文件格式: PDF大小: 180.62KB页数: 3
1)Plot resolution and depth of field as a function of exposure wavelength for a projection aligner with 100nm
文件格式: PDF大小: 76.16KB页数: 1
Problem 1 Deal-Grove model states that the thickness of the oxide is related to a time constant r and two constants A and b by the relation
文件格式: PDF大小: 267.12KB页数: 3
Solubility limit for P at 1273 K is Co 2 1 x 10 cm\. Intrinsic carrier concentration is 10 cm\. Thus, before including higher order terms, Do=13x10-4 cm2/s. But with first order and second order correction terms
文件格式: PDF大小: 528.88KB页数: 4
Diffusion: Read Plummer Chap. 7, sections 7.1-7.4,, 7.53, 7.5.8 Show that c(zt) Wroexpfzla)I,with a=2VDf, is a solution to Fick's second law of diffusion. ac(z, t) dc(zt) 2. a) What is the intrinsic carrier concentration in Si at 1100 C? b) Calculate the effective diffusivity (including first-order, charged-vacancy corrections)for As impurities in Si at 1100 C for two cases: 1)CAs=10 cm and ii)
文件格式: PDF大小: 160.66KB页数: 2
Due Sept 17. 2002 1. a) Mean free path 2= kBI d-p where k=1.38×102,T=293K,p=10mTor=133Pa,d=1A=100m 38×10-3(293 6.9cm ford=1A Jr(m)(332)017mfrd=2A b) Use the ideal gas law pV=nkB T 1.33Pa vk7(138×102X90)33×10m-33×10cm3
文件格式: PDF大小: 60.62KB页数: 6
Reading Assignment: Kinetics, Vac. Tech: Campbell, 10.1-1. 4(or Ohring Ch 2) 1. Consider a vacuum system at room temperature that has been pumped down to a 10 m-Torr with mostly nitrogen as determined from the residual gas analyzer. Make an in
文件格式: PDF大小: 29.12KB页数: 2
MEMS Mask layout Die leve Dark-field mask Dimensions are in micron
文件格式: PDF大小: 25.27KB页数: 1
Microelectronics Processing technology Fall Term 2003 Instructions for the microfluidics Lab report Your lab report should follow the format of the IEEE Electron Device Letters. The format from the IC and mEMs Lab reports will be used Contents: Your Letter should include the following sections y-line(Author, affiliation, and submission date)
文件格式: PDF大小: 78.54KB页数: 1
Microelectronics Processing technology Fall Term 2003 Instructions for the mems Lab report Your lab report should follow the format of the IEEE Electron Device Letters. The format from the IC Lab report will be used Contents: Your Letter should include the following sections
文件格式: PDF大小: 93.41KB页数: 2
兰州交通大学:《通信原理》课程各章作业习题(含参考答案)新疆大学:《单片机原理及应用》课程教学资源(PPT课件)第3章 MCS-51系列单片机指令系统湖北师范学院物理系:《电路分析》第十六章 二端口网络(王成艳)《数字逻辑电路》课程教学课件(PPT讲稿)第十章 脉冲波形的产生和整形《电路》课程教学课件(PPT讲稿)第1章 电路模型及定律(山东理工大学:王艳萍)《电路》课程教学资源(A)课件(内容+例题,图片版)第13章 非正弦电路南京邮电大学:《电路分析》第七章(7-1) 正弦量兰州交通大学:《电工学》课程授课教案(打印版)电工电子技术教案(二)《电子材料及元器件》参考教材PDF电子书(共十二章,含六个实验)《电路》课程教学资源(PPT课件)第1章 电路模型和电路定律新疆大学:《单片机原理及应用》课程授课教案(讲义,共五章,负责人:帕孜来.马合木提)










