2. Microarray manufacturing The three main manufacturing methods Contact printing uses direct contact between the printing implement or the sample contained in the implement and the microarray substrate; Noncontact printing on-the-fly printing including ink-jet tech. microsolenoid tech. and thermal bubble jet dispenser Semiconductor tech: photolithographic masks and micromirrors
2.Microarray manufacturing The three main manufacturing methods: • Contact printing:uses direct contact between the printing implement or the sample contained in the implement and the microarray substrate; • Noncontact printing:on-the-fly printing including ink-jet tech.,microsolenoid tech.,and thermal bubble jet dispenser; • Semiconductor tech: photolithographic masks and micromirrors
Microscopic elements (Semiconductor tech produce 15~30um features 2 Printed spot size is 50-350 um 3 Tissue spot is 200-600 um Macroarrays contain sample spot sizes of about 300 microns or larger microarray are typically less than 200 microns in diameter
• Microscopic elements: ①Semiconductor tech produce 15~30μm features ② Printed spot size is 50~350 μm ③ Tissue spot is 200~600 μm Macroarrays contain sample spot sizes of about 300 microns or larger microarray are typically less than 200 microns in diameter
Gene chips的制备 在片原位光刻合成 e dntp-5-光敏保护基因 光照 odNTP-OH+dNTP5-保护基因
Gene chips的制备 在片原位光刻合成 • O d NTP- 5´-光敏保护基因 光照 O dNTP-OH + dNTP -5´-保护基因
NO. 0—C=0 偶联反应封材反应氧化反应 CHa Base N 0—C=0 OH CH, Base 5′CH2Base 0 光照 +C02+ H 脱保护基 R-0—P=0 R-0-P=0 在片原位喷印合成
在片原位喷印合成
Gene chips的制备 CDNA点样法 醛基修饰玻片 Silanized slide(与DNA上氨基反应) Silane slide 氨基修饰玻片 Silylated slide(Uv照射与DNA交联) Polylysine slide 玻片氨基化举例: oH C2H5O 0 OH+ C2H5O-Si-(CHa)3-NH→0i(E OH C2HSO/ 0
Gene chips的制备 cDNA点样法 醛基修饰玻片 Silanized slide（与DNA上氨基反应） Silane slide 氨基修饰玻片 Silylated slide（UV照射与DNA交联） Polylysine slide 玻片氨基化举例：