Table 20x The hydrogen halides Molar mass, Melting point, Boiling point, pK Bond enthal Bond length, Compound g/mol C °C in water kJ/mol 20.01 3.45 565 92 HCI 36.46 115 -85 stro ng 421 127 HBr 80.92 -89 -6 stro ng 366 HI 12791 51 35 strong 299 100 H, H2(g)+X2(g)→2HX(g) HF H,Te H,S BHI CaF2()+2H,SO4(ag, conc) HCI- -100 3號→ca(HSO)2(aq)+2HF(g) PH: GeH, AsH3 CH4 Si 200 5 KI(s)+H3PO4(aq)△→ Period 氢键 KH2PO(aq+H(g
H2 (g) + X2 (g) → 2HX(g) CaF2 (s) + 2H2SO4 (aq, conc) → Ca(HSO4 )2 (aq)+ 2HF(g) KI(s) + H3PO4 (aq) → KH2PO4 氢键 (aq)+ HI(g)
(HF Nh4F) frosts the glass surface SiO2(s)+4HF(aq)→SiF4(g)+2H2O()△G°=-120kJ/mol HF具有强腐蚀性!
(HF + NH4F) frosts the glass surface SiO2 (s) + 4HF(aq) → SiF4 (g) + 2H2O(l) Go = -12.0kJ/mol HF具有强腐蚀性！
Tube furnace G Br/N. Gable
解离能 电子亲核能 F(g)+Na(g)+e(g) g+Na(g)+e(g) +7899F2(+Ntg+e(g)p 121.68 -334.38 lc2(9)+Na(g)+e(g) 354.81 F(g)+ Na(g +609.36 升华热十电离能 609.36 CI(g+ Na(g) 2F2(g)+Na(s)-150559 787.38 生成焓晶格能 lcL(g+Na(s) 晶格能 7365 生成焓 411.15 NaF(s) Nacl(s) 离子型氯化物的生成焓和晶格能
生成焓 晶格能 晶格能 生成焓 离子型氯化物的生成焓和晶格能 电子亲核能 解离能 升华热+ 电离能
habe20.8 Halogen oxoacids(含氧酸 Oxidation General General Known p K number formula acid name exan n water HXO4 perhalic acid E HCIO 4 strong HBrO4 strong HIO 1.64 HXO3 halic acid HCIO3 strong g HEro strong HIO 0.77 HXO halos acid 亚 HCIO 2.00 HBI unstable HXO hypohalous acid次HFo unstable HCIO 7.53 HEro 8.69 HIO 10.64
含氧酸 亚 次 高