University of Electronic Science and Technology of China 1956 1.光波导材料介绍 有机材料优点 易于成膜：旋涂法；浸渍涂敷法 ② 光学性能优良：<0.1dB/cm,1550nm ③ 折射率可调：1.3-1.7 ④ 工艺简单：紫外曝光法，压印法，RE ⑤ 材料众多，低成本：材料工程，按需设计 ⑥ 波导端面易于形成：通常可解理硅衬底 易于制作三维集成光波导器件：成膜容易 较大的热光效应：优点？缺点？ 某些材料可实现电光效应：极化聚合物 11
University of Electronic Science and Technology of China 11 ❑ 有机材料-优点 1.光波导材料介绍 ① 易于成膜：旋涂法；浸渍涂敷法 ② 光学性能优良：<0.1 dB/cm，1550 nm ③ 折射率可调：1.3-1.7 ④ 工艺简单：紫外曝光法，压印法，RIE ⑤ 材料众多，低成本：材料工程，按需设计 ⑥ 波导端面易于形成：通常可解理硅衬底 ⑦ 易于制作三维集成光波导器件：成膜容易 ⑧ 较大的热光效应：优点？缺点？ ⑨ 某些材料可实现电光效应：极化聚合物
University of Electronic Science and Technology of China 956 1.光波导材料介绍 有机材料-缺点 ① 热稳定性差 ② 老化问题 ③ 湿度影响 ④ 极化聚合物的退极化问题 12
University of Electronic Science and Technology of China 12 ❑ 有机材料-缺点 1.光波导材料介绍 ① 热稳定性差 ② 老化问题 ③ 湿度影响 ④ 极化聚合物的退极化问题
University of Electronic Science and Technology of China 1.光波导材料介绍 956 有机材料 表6-2.常用有机材料的中英文 英文 中文 英文 中文 Acrylate 丙烯酸酯 Polyurethane 聚氨酯 Halogenated 卤代丙烯酸酯 Fluorinated 氟化聚酰亚胺 Acrylate Polymide Polycarbonate 聚碳酸酯 Epoxy(SU-8) 环氧树脂 Polymethyl 聚甲基丙烯酸甲 Benzocyclo- 苯并环丁烯 Methacrylate 酯 butene (BCB) (苯环丁烷) (PMMA) Polymide 聚酰亚胺 Polystyrene 聚苯乙烯 Deuterated 氘化的聚硅氧烷Polyetheri--mide 聚醚酰亚胺 Polysiloxane 13
University of Electronic Science and Technology of China 13 1.光波导材料介绍 ❑ 有机材料 英文 中文 英文 中文 Acrylate 丙烯酸酯 Polyurethane 聚氨酯 Halogenated Acrylate 卤代丙烯酸酯 Fluorinated Polymide 氟化聚酰亚胺 Polycarbonate 聚碳酸酯 Epoxy (SU-8) 环氧树脂 Polymethyl Methacrylate (PMMA) 聚甲基丙烯酸甲 酯 Benzocyclobutene （BCB） 苯并环丁烯 （苯环丁烷） Polymide 聚酰亚胺 Polystyrene 聚苯乙烯 Deuterated Polysiloxane 氘化的聚硅氧烷 Polyetheri-mide 聚醚酰亚胺 表6-2. 常用有机材料的中英文
University of Electronic Science and Technology of China 1.光波导材料介绍 表6-3.主要光学聚合物材料关健性能-1 Manufacturer Polymer Type Patterning Propagation Loss,Single- Mode Waveguide,dB/cm Other Properties [Trade Name] Techniques [wavelength,nm] [wavelength,nm] Amoco Fluorinated polyimide Photoexposure 0.4[1300] Birefringence:0.025 [UItradelTM wet etch 1.0[15501 Crosslinked,Thermally stable Photoexposure/ 0.028401 Birefringence:0.0002 [1550] Acrylate wet etch.RIE. 0.3[1300] Crosslinked,T:25C Corning laser ablation 0.8[15501 Environmentally stable (formerly AlliedSignal) Photoexposure/ <0.01[840] Birefringence:<0.000001 [1550] Halogenated acrylate wet etch,RIE, 0.06[1300] Crosslinked,Tg:-50℃ laser ablation 0.2[1550] Environmentally stable Benzocyclobutene [CycloteneTM] RIE 0.8[1300] Tg:>350C Dow Chemical 1.5j15501 Perfluorocyclobutene Photoexposure 0.25[1300] XU351211 wet etch 0.25[15501 Tg:400℃ Gemfire [Gemfire] Photoexposure 1.0[1550] Birefringence:0.0002 [1550] wet etch Crosslinked General Electric Polyetherimide RIE,laser [UItemTM ablation 0.24[830] Thermally stable Birefringence:0.009 [1300] Hitachi Fluorinated polyimide Photoexposure wet etch TE:0.5,TM0.6[1300] PDL:0.1dB/cm[1300] T:310C,Thermally stable Hoechst Celanese PMMA copolymer [P2ANS] Photobleaching 1.0[1300] NLO polymer Poly(methylmethacrylate)with NLO polymer Ipitek CLD-1 chromophore RIE 5.0[1300] r33=60pmW[1300] [PMMA-CLD-11 Pigtail loss=3.5 dB facet JDS Uniphase Polycarbonate RIE (formerly Akzo Nobel) [BeamBoxM] 0.6[1550] Thermally stable 14
University of Electronic Science and Technology of China 14 表6-3. 主要光学聚合物材料关键性能-1 1.光波导材料介绍
University of Electronic Science and Technology of China 1.光波导材料介绍 956 表63.主要光学聚合物材料关键性能-2 Fluorinated poly(arylene PDL:0.02 dB/cm [1550] K-JIST ether sulfide) RIE TE:0.42,TM:0.4[1550 Birefringence:0.0003 [1550] [FPAESI] Crosslinked,Thermally stable Polyurethane with NLO polymer Lumera FTC chromophore RIE 2.0[1300 r33=25pmW[1310] [PU-FTC] Pigtail loss=5 dB/facet 0.02[830] Halogenated acrylate RIE 0.07[1310] Birefringence:0.000006[1310] 1.7[1550] To:110C NTT Deuterated polysiloxane RIE 0.17[1310 0.43[1550] Environmentally stable Fluorinated polyimide RIE TE:0.3,TM0.7[1310 PDL:0.4dB/cm[1310] Environmentally stable Optical Crosslinks 0.18[800] (formerly Dupont and Acrylate Diffusion 0.2[1300] Laminated sheets Excimer laser machinable Polymer Photonics) [Polyguide 0.6[15501 Polycarbonate with NLO polymer PacificWave CLD-1 chromophore RIE 1.8[1550] r33=70pmW[1310] [PC-CLD-1] Pigtail loss =1.5 dB/facet Redfern Inorganic polymer glass IPGTM RIE Environmentally stable Photoexposure/ <0.01[840] Telephotonics [OASICTM] wet etch,RIE, 0.03[1300 Environmentally stable laser ablation 0.1[1550] 15
University of Electronic Science and Technology of China 15 表6-3. 主要光学聚合物材料关键性能-2 1.光波导材料介绍