Horizontal LPCVD Reactor Pressure Water-Cooled End Gauge Cap Assembly Wafer 3-Zone Resistive Heater Vacuum Load/Unload Break Valve End Cap ▣ Batch of Wafers Silica Reactor Tube Dry N2 Wafer Boat Particulate Filter Mechanical Dry N2 Ballast Valve☐ Booster Pump Mass Flow Controller System Rotary Pump Oll Piston Gas Cabinet Purifier Mechanical N2 O2 NH3 Si2HCl2 PH3 SiH4 Pump Exhaust
Microwave synthesis apparatus f=2.45GH
Microwave synthesis apparatus f = 2.45GHz
Sputter Station ·Target::Au,Ag,Pt,Pd ·Power:500W
Sputter Station • Target: Au, Ag, Pt, Pd • P 500 W Power: ~500 W
Sputter Station C1GS器件结构 Magnetic field used to confine plasma and electric field used to accelerate DC plasma used for conductive metals RF plasma used for nonconductive dielectrics Several targets can mix or due layers without breaking vacuum
Sputter Station CIGS器件结构 • Magnetic field used to confine plasma and electric field used to accelerate • DC plasma used for conductive metals • RF plasma used for nonconductive dielectrics • Several targets can mix or due layers without breaking vacuum
Solid state reaction for gas-sensors 引线电极 、引线 sen com 加若丝 电极 艳缘气臂SnO,烧结体
Solid state reaction for gas-sensors Chemical spray deposition